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reactive ion etch中文是什么意思

  • 活性离子腐蚀

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  • Narrow gap reactive ion etching system
    狭窄间隙反应性离子蚀刻系统
  • Reactive ion etching system rie system
    反应性离子蚀刻系统
  • The reactor is capable of working in the rie ( reactive ion etching ) mode and also in the plasma etching mode
    反应腔拥有在rie (反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
  • Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching ( ecr - rie ) equipment to improve its property of weave
    摘要采用微波电子回旋共振等离子体反应离子刻蚀( ecr - rie )装置对牦牛毛纤维进行表面改性,从而改善牦牛毛的可纺性。
  • Kionix manufactures inertial sensors using plasma micromachining , a highly - refined , proprietary , deep reactive ion etch drie fabrication technology . the resulting products are ultra - small mechanical elements integrated with electronics to create microelectromechanical systems mems
    Kionix的惯性sensor采用的plasma微机电制程,是一种经高度改良且有独家专利制程,使产品的机械结构部份做到最小并同时与电子电路结合形成一先进的微机电产品
  • By studying and using conventional 1c process in combination with electron beam lithography ( ebl ) , reactive ion etching ( rie ) and lift - off process , several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires , si quantum dots , double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes
    研究利用常规的硅集成电路工艺技术结合电子束光刻,反应离子刻蚀和剥离等技术制备半导体和金属纳米结构,很好地解决了普通光刻与电子束光刻的匹配问题,提高了加工效率,经过多次的工艺实验,摸索出一套制备纳米结构的工艺方法,首次用电子束光刻,反应离子刻蚀和剥离等技术制备出了多种纳米结构(硅量子线、量子点,双量子点和三叉指状的金属栅结构) 。
  • A large number of attempt and painstaking experiment have been done in this paper according to existing project . we also do lots of chemical and electrochemical etching research in material of lab6 , and find out three kind of methods to produce the field emitting cold cathode including reactive ion etching ( rie ) with oxygen , wet process etching and electrochemical etching . through produce some field emitting cold cathode single tip including lab6 field emitting cold cathode , molybdenum field emitting cold cathode , tungsten field emitting cold cathode , tungsten rhenium field emitting cold cathode , molybdenum covered with lab6 film field emitting cold cathode
    而且,目前可借鉴的参考文献较少,围绕着前人做过的方案,本文做了大量工作,在已有文献介绍的基础上,结合原有的理论和实践基础,摸索出了包括高温氧作用反应离子( rie )刻蚀法、湿法腐蚀法和电化学腐蚀法在内的三种制备工艺,运用电化学腐蚀工艺成功制备了单尖的六硼化镧场发射冷阴极尖锥、钼场发射冷阴极尖锥、钨场发射冷阴极尖锥、钨铼合金场发射冷阴极尖锥以及有六硼化镧薄膜覆盖的钼场发射冷阴极尖锥。
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Last modified time:Mon, 11 Aug 2025 00:29:56 GMT

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